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from public policy analysis to international law
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The Physics of Submicron Lithography formatIsbn:Softcover - 9781461364610 from public policy analysis toThis book is devoted to the physics of electron beam, ion beam, optical, and x ray lithography. The need for this book results from the following considerations. The astonishing achievements in microelectronics are in large part connected with successfully applying the relatively new technology of processing (changing the prop erties of) a material into a device whose component dimensions are submicron, called photolithography. In this method the